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Vacuum ultraviolet photochemical selective area atomic layer deposition of Al2O3 dielectrics (2015)

First Author: Chalker P

Attributed to: Manufacturing with Light 2: photochemical ALD to manufacture functional thin films funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.4905887

Publication URI: http://dx.doi.org/10.1063/1.4905887

Type: Journal Article/Review

Parent Publication: AIP Advances

Issue: 1

ISSN: 21583226