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The effect of pattern overlap on the accuracy of high resolution electron backscatter diffraction measurements. (2015)

First Author: Tong V

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.ultramic.2015.04.019

PubMed Identifier: 25957534

Publication URI: http://europepmc.org/abstract/MED/25957534

Type: Journal Article/Review

Volume: 155

Parent Publication: Ultramicroscopy

ISSN: 0304-3991