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Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography (2013)

First Author: Li H

Attributed to: An Innovative Electronics Manufacturing Research Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/c3ra40188j

Publication URI: http://dx.doi.org/10.1039/c3ra40188j

Type: Journal Article/Review

Parent Publication: RSC Advances

Issue: 29