Effects of Ar and O 2 Plasma Etching on Parylene C: Topography versus Surface Chemistry and the Impact on Cell Viability (2015)
Attributed to:
Reliably unreliable nanotechnologies
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/ppap.201500053
Publication URI: http://dx.doi.org/10.1002/ppap.201500053
Type: Journal Article/Review
Parent Publication: Plasma Processes and Polymers
Issue: 3