Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide (2014)

First Author: Potter K

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.microrel.2014.07.018

Publication URI: http://dx.doi.org/10.1016/j.microrel.2014.07.018

Type: Journal Article/Review

Parent Publication: Microelectronics Reliability

Issue: 9-10