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Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using inductively coupled plasma etching (2012)

First Author: Mirza M
Attributed to:  Silicon Resonant Tunnelling Diodes and Circuits funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1116/1.4755835

Publication URI: http://dx.doi.org/10.1116/1.4755835

Type: Journal Article/Review

Parent Publication: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Issue: 6