Improved alignment algorithm for electron beam lithography (2014)
Attributed to:
Scanning thermal conduction microscopy with dual cantilever resistive probe
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1116/1.4901015
Publication URI: http://dx.doi.org/10.1116/1.4901015
Type: Journal Article/Review
Parent Publication: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Issue: 6