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Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H 2 and CF 4 (2016)

First Author: Bruneau B

Attributed to: Metrology concepts for a new generation of plasma manufacturing with atom-scale precision funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0963-0252/25/1/01lt02

Publication URI: http://dx.doi.org/10.1088/0963-0252/25/1/01lt02

Type: Journal Article/Review

Parent Publication: Plasma Sources Science and Technology

Issue: 1