Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H 2 and CF 4 (2016)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0963-0252/25/1/01lt02
Publication URI: http://dx.doi.org/10.1088/0963-0252/25/1/01lt02
Type: Journal Article/Review
Parent Publication: Plasma Sources Science and Technology
Issue: 1