A novel route for the inclusion of metal dopants in silicon. (2010)
Attributed to:
Molecular Thin Films: Growth, Magnetism and Spintronic Applications
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0957-4484/21/2/025304
PubMed Identifier: 19955611
Publication URI: http://europepmc.org/abstract/MED/19955611
Type: Journal Article/Review
Volume: 21
Parent Publication: Nanotechnology
Issue: 2
ISSN: 0957-4484