Quality control for deep x-ray lithography (LIGA): a preliminary metrology study (2012)

First Author: Meyer P
Attributed to:  EPSRC Centre for Innovative Manufacturing in Ultra Precision funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1007/s00542-012-1448-6

Publication URI: http://dx.doi.org/10.1007/s00542-012-1448-6

Type: Journal Article/Review

Parent Publication: Microsystem Technologies

Issue: 4