Effects of post-deposition vacuum annealing on film characteristics of p-type Cu2O and its impact on thin film transistor characteristics (2016)
Attributed to:
The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4965848
Publication URI: http://dx.doi.org/10.1063/1.4965848
Type: Journal Article/Review
Parent Publication: Applied Physics Letters
Issue: 17