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Effects of post-deposition vacuum annealing on film characteristics of p-type Cu2O and its impact on thin film transistor characteristics (2016)

First Author: Han S

Attributed to: The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.4965848

Publication URI: http://dx.doi.org/10.1063/1.4965848

Type: Journal Article/Review

Parent Publication: Applied Physics Letters

Issue: 17