📣 Help Shape the Future of UKRI's Gateway to Research (GtR)

We're improving UKRI's Gateway to Research and are seeking your input! Tell us what works, what doesn't, and how we can make GtR more user-friendly, impactful, and effective for the Research and Innovation community. Please send your feedback to gateway@ukri.org by 11 August 2025.

A mechanism for Frenkel defect creation in amorphous SiO2 facilitated by electron injection. (2016)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0957-4484/27/50/505207

PubMed Identifier: 27855121

Publication URI: http://europepmc.org/abstract/MED/27855121

Type: Journal Article/Review

Volume: 27

Parent Publication: Nanotechnology

Issue: 50

ISSN: 0957-4484