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Fast, downstream removal of photoresist using reactive oxygen species from the effluent of an atmospheric pressure plasma Jet (2016)

First Author: West A

Attributed to: Metrology concepts for a new generation of plasma manufacturing with atom-scale precision funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0963-0252/25/2/02lt01

Publication URI: http://dx.doi.org/10.1088/0963-0252/25/2/02lt01

Type: Journal Article/Review

Parent Publication: Plasma Sources Science and Technology

Issue: 2