Fast, downstream removal of photoresist using reactive oxygen species from the effluent of an atmospheric pressure plasma Jet (2016)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0963-0252/25/2/02lt01
Publication URI: http://dx.doi.org/10.1088/0963-0252/25/2/02lt01
Type: Journal Article/Review
Parent Publication: Plasma Sources Science and Technology
Issue: 2