Optimisation of amorphous zinc tin oxide thin film transistors by remote-plasma reactive sputtering (2016)

First Author: Niang K
Attributed to:  The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.4961608

Publication URI: http://dx.doi.org/10.1063/1.4961608

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 8