Photochemical atomic layer deposition and etching (2016)
Attributed to:
Manufacturing with Light 2: photochemical ALD to manufacture functional thin films
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.surfcoat.2016.02.046
Publication URI: http://dx.doi.org/10.1016/j.surfcoat.2016.02.046
Type: Journal Article/Review
Parent Publication: Surface and Coatings Technology