Performance of a high resolution chemically amplified electron beam resist at various beam energies (2016)

First Author: Yang D
Attributed to:  High-resolution Electron Beam Lithography Critical Mass Grant funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2016.03.010

Publication URI: http://dx.doi.org/10.1016/j.mee.2016.03.010

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering