Averaging the intensity of many-layered structures for accurate stacking-fault analysis using Rietveld refinement (2016)
Attributed to:
New Oxychalcogenides for Electronic, Magnetic and Optical Applications
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1107/s1600576716013066
Publication URI: http://dx.doi.org/10.1107/s1600576716013066
Type: Journal Article/Review
Parent Publication: Journal of Applied Crystallography
Issue: 5
ISSN: 1600-5767