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Use of gas cluster ion source depth profiling to study the oxidation of fullerene thin films by XPS (2017)

First Author: McGettrick J

Attributed to: SPECIFIC IKC Phase 2 funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.orgel.2017.06.022

Publication URI: http://dx.doi.org/10.1016/j.orgel.2017.06.022

Type: Journal Article/Review

Parent Publication: Organic Electronics