Hole trapping in amorphous HfO2 and Al2O3 as a source of positive charging (2017)
Attributed to:
Structural dynamics of amorphous functional oxides - the role of morphology and electrical stress
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2017.05.012
Publication URI: http://dx.doi.org/10.1016/j.mee.2017.05.012
Type: Journal Article/Review
Parent Publication: Microelectronic Engineering