Optical Emission from C 2 - Anions in Microwave-Activated CH 4 /H 2 Plasmas for Chemical Vapor Deposition of Diamond (2017)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpca.7b00814
PubMed Identifier: 28317379
Publication URI: http://europepmc.org/abstract/MED/28317379
Type: Journal Article/Review
Parent Publication: The Journal of Physical Chemistry A
Issue: 14
ISSN: 1089-5639