The effect of aluminium on the post-anneal concentration of ion implanted bismuth in silica thin films (2015)
Attributed to:
Silicon emission technologies based on nanocrystals
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.nimb.2015.07.036
Publication URI: http://dx.doi.org/10.1016/j.nimb.2015.07.036
Type: Journal Article/Review
Parent Publication: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms