The effect of aluminium on the post-anneal concentration of ion implanted bismuth in silica thin films (2015)

First Author: Southern-Holland R
Attributed to:  Silicon emission technologies based on nanocrystals funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.nimb.2015.07.036

Publication URI: http://dx.doi.org/10.1016/j.nimb.2015.07.036

Type: Journal Article/Review

Parent Publication: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms