Investigations of Asymmetric Spacer Tunnel Layer Diodes for High-Frequency Applications (2018)
Attributed to:
Future Compound Semiconductor Manufacturing Hub
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/ted.2017.2777803
Publication URI: http://dx.doi.org/10.1109/ted.2017.2777803
Type: Journal Article/Review
Parent Publication: IEEE Transactions on Electron Devices
Issue: 1