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Controlling plasma properties under differing degrees of electronegativity using odd harmonic dual frequency excitation (2017)

First Author: Gibson A

Attributed to: Metrology concepts for a new generation of plasma manufacturing with atom-scale precision funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/1361-6595/aa8dcd

Publication URI: http://dx.doi.org/10.1088/1361-6595/aa8dcd

Type: Journal Article/Review

Parent Publication: Plasma Sources Science and Technology

Issue: 11

ISSN: 0963-0252