Controlling plasma properties under differing degrees of electronegativity using odd harmonic dual frequency excitation (2017)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/1361-6595/aa8dcd
Publication URI: http://dx.doi.org/10.1088/1361-6595/aa8dcd
Type: Journal Article/Review
Parent Publication: Plasma Sources Science and Technology
Issue: 11
ISSN: 0963-0252