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Low Temperature Annealing Improves the Electrochromic and Degradation Behavior of Tungsten Oxide (WO x ) Thin Films (2017)

First Author: Thummavichai K

Attributed to: University of Exeter - Equipment Account funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpcc.7b06300

Publication URI: http://dx.doi.org/10.1021/acs.jpcc.7b06300

Type: Journal Article/Review

Parent Publication: The Journal of Physical Chemistry C

Issue: 37