Thermally activated defects in float zone silicon: Effect of nitrogen on the introduction of deep level states (2018)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.5036718

Publication URI: http://dx.doi.org/10.1063/1.5036718

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 3