Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering (2019)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.nimb.2018.06.023
Publication URI: http://dx.doi.org/10.1016/j.nimb.2018.06.023
Type: Journal Article/Review
Parent Publication: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms