A New RAM Normalized 1$f$-WMS Technique for the Measurement of Gas Parameters in Harsh Environments and a Comparison With ${2f\!/\!1f}$ (2018)
Attributed to:
In-situ Chemical Measurement and Imaging Diagnostics for Energy Process Engineering
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/jphot.2018.2883548
Publication URI: http://dx.doi.org/10.1109/jphot.2018.2883548
Type: Journal Article/Review
Parent Publication: IEEE Photonics Journal
Issue: 6