A microscopic mechanism of dielectric breakdown in SiO2 films: An insight from multi-scale modeling (2017)
Attributed to:
MATERIALS CHEMISTRY HIGH END COMPUTING CONSORTIUM
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4979915
Publication URI: http://dx.doi.org/10.1063/1.4979915
Type: Journal Article/Review
Parent Publication: Journal of Applied Physics
Issue: 15