Low Temperature Annealing Improves the Electrochromic and Degradation Behavior of Tungsten Oxide (WO x ) Thin Films (2017)

First Author: Thummavichai K
Attributed to:  Wearable and flexible technologies enabled by advanced thin-film manufacture and metrology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpcc.7b06300

Publication URI: http://dx.doi.org/10.1021/acs.jpcc.7b06300

Type: Journal Article/Review

Parent Publication: The Journal of Physical Chemistry C

Issue: 37