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Strain in epitaxial MnSi films on Si(111) in the thick film limit studied by polarization-dependent extended x-ray absorption fine structure (2016)

First Author: Figueroa A

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1103/physrevb.94.174107

Publication URI: http://dx.doi.org/10.1103/physrevb.94.174107

Type: Journal Article/Review

Parent Publication: Physical Review B

Issue: 17

ISSN: 2469-9950