Exchange bias induced at a Co 2 FeAl 0.5 Si 0.5 /Cr interface (2017)

First Author: Yu C
Attributed to:  High-resolution Electron Beam Lithography Critical Mass Grant funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/1361-6463/aa560d

Publication URI: http://dx.doi.org/10.1088/1361-6463/aa560d

Type: Journal Article/Review

Parent Publication: Journal of Physics D: Applied Physics

Issue: 12