Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal-Organic Resist and Helium Ion Beam Lithography. (2019)

First Author: Lewis SM
Attributed to:  Manufacturing at the 7nm node and beyond enabled by novel resist technology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acs.nanolett.9b01911

PubMed Identifier: 31424217

Publication URI: http://europepmc.org/abstract/MED/31424217

Type: Journal Article/Review

Volume: 19

Parent Publication: Nano letters

Issue: 9

ISSN: 1530-6984