Top-down fabrication of GaN nano-laser arrays by displacement Talbot lithography and selective area sublimation (2019)

First Author: Damilano B
Attributed to:  Manufacturing of nano-engineered III-N semiconductors: Equipment Business Case funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.7567/1882-0786/ab0d32

Publication URI: http://dx.doi.org/10.7567/1882-0786/ab0d32

Type: Journal Article/Review

Parent Publication: Applied Physics Express

Issue: 4