Thin Ge buffer layer on silicon for integration of III-V on silicon (2019)
Attributed to:
Future Compound Semiconductor Manufacturing Hub
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.jcrysgro.2019.02.044
Publication URI: http://dx.doi.org/10.1016/j.jcrysgro.2019.02.044
Type: Journal Article/Review
Parent Publication: Journal of Crystal Growth