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Combined Spatially Resolved Optical Emission Imaging and Modeling Studies of Microwave-Activated H 2 /Ar and H 2 /Kr Plasmas Operating at Powers and Pressures Relevant for Diamond Chemical Vapor Deposition (2019)

First Author: Mahoney E

Attributed to: Metrology concepts for a new generation of plasma manufacturing with atom-scale precision funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpca.8b12294

PubMed Identifier: 30852899

Publication URI: http://europepmc.org/abstract/MED/30852899

Type: Journal Article/Review

Parent Publication: The Journal of Physical Chemistry A

Issue: 13

ISSN: 1089-5639