Combined Spatially Resolved Optical Emission Imaging and Modeling Studies of Microwave-Activated H2/Ar and H2/Kr Plasmas Operating at Powers and Pressures Relevant for Diamond Chemical Vapor Deposition. (2019)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpca.8b12294
PubMed Identifier: 30852899
Publication URI: http://europepmc.org/abstract/MED/30852899
Type: Journal Article/Review
Volume: 123
Parent Publication: The journal of physical chemistry. A
Issue: 13
ISSN: 1089-5639