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ReaxFF molecular dynamics simulation study of nanoelectrode lithography oxidation process on silicon (100) surface (2019)

First Author: Hasan R

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2019.143679

Publication URI: http://dx.doi.org/10.1016/j.apsusc.2019.143679

Type: Journal Article/Review

Parent Publication: Applied Surface Science