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Threshold reduction and yield improvement of semiconductor nanowire lasers via processing-related end-facet optimization. (2019)

First Author: Alanis JA

Attributed to: Sir Henry Royce Institute - Manchester and NNL Equipment funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/c9na00479c

PubMed Identifier: 36134418

Publication URI: http://europepmc.org/abstract/MED/36134418

Type: Journal Article/Review

Volume: 1

Parent Publication: Nanoscale advances

Issue: 11

ISSN: 2516-0230