Threshold reduction and yield improvement of semiconductor nanowire lasers via processing-related end-facet optimization. (2019)
Attributed to:
ir Henry Royce InsStitute - recurrent grant
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1039/c9na00479c
PubMed Identifier: 36134418
Publication URI: http://europepmc.org/abstract/MED/36134418
Type: Journal Article/Review
Volume: 1
Parent Publication: Nanoscale advances
Issue: 11
ISSN: 2516-0230