Single step ohmic contact for heavily doped n-type silicon (2020)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2019.144686

Publication URI: http://dx.doi.org/10.1016/j.apsusc.2019.144686

Type: Journal Article/Review

Parent Publication: Applied Surface Science