High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films (2013)
Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/pssb.201248520
Publication URI: http://dx.doi.org/10.1002/pssb.201248520
Type: Journal Article/Review
Parent Publication: physica status solidi (b)
Issue: 5