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Use of Two-Photon Lithography with a Negative Resist and Processing to Realise Cylindrical Magnetic Nanowires. (2020)

First Author: Askey J

Attributed to: 4PI Two-photon Lithography for Isotropic 3D Nanostructure Fabrication funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.3390/nano10030429

PubMed Identifier: 32121262

Publication URI: http://europepmc.org/abstract/MED/32121262

Type: Journal Article/Review

Volume: 10

Parent Publication: Nanomaterials (Basel, Switzerland)

Issue: 3

ISSN: 2079-4991