Use of Two-Photon Lithography with a Negative Resist and Processing to Realise Cylindrical Magnetic Nanowires. (2020)
Attributed to:
4PI Two-photon Lithography for Isotropic 3D Nanostructure Fabrication
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.3390/nano10030429
PubMed Identifier: 32121262
Publication URI: http://europepmc.org/abstract/MED/32121262
Type: Journal Article/Review
Volume: 10
Parent Publication: Nanomaterials (Basel, Switzerland)
Issue: 3
ISSN: 2079-4991