Directed self-assembly of InAs quantum dots using in situ interference lithography (2020)
Attributed to:
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1117/12.2544875
Publication URI: http://dx.doi.org/10.1117/12.2544875
Type: Conference/Paper/Proceeding/Abstract