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Directed self-assembly of InAs quantum dots using in situ interference lithography (2020)

First Author: Wang Y

Attributed to: In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1117/12.2544875

Publication URI: http://dx.doi.org/10.1117/12.2544875

Type: Conference/Paper/Proceeding/Abstract