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Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering (2019)

First Author: Hanby B

Attributed to: University of Nottingham - Equipment Account funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2019.06.202

Publication URI: http://dx.doi.org/10.1016/j.apsusc.2019.06.202

Type: Journal Article/Review

Parent Publication: Applied Surface Science