Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering (2019)
Attributed to:
University of Nottingham - Equipment Account
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2019.06.202
Publication URI: http://dx.doi.org/10.1016/j.apsusc.2019.06.202
Type: Journal Article/Review
Parent Publication: Applied Surface Science